Vacuum cathodic arc deposition machine

This range of machines based on vacuum cathodic arc deposition technology is dedicated to batch production. These machines are both standard and adaptable to specific requirements.

The wide range of equipment contained in our HC800 and HC110 cathodic arc thin film deposition systems offers 3 essential advantages:

  • Each cathode has a shutter
  • Equipped with a heating grid for long heating life
  • Plasma booster system for high-performance stripping of parts
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HC800

Cathodic arc deposition machine

The HC800 system is geared towards production and can accommodate up to two x mm arc cathodes, enabling the production of complex multilayers.

HC1100

Cathodic arc deposition machine

Thanks to its large volume, our HC1100 vacuum cathodic arc deposition system offers a wide range of configurations. This equipment can process a large number of substrates per run.

Download the HC brochure

Features of the HC range

HC 800HC 1100
Number of cathodes2 cathodes4 cathodes
PumpingTwo-stage primary + turbo pumpTwo-stage primary + roots pump + turbo pump
Gas lineUp to 7 gas linesUp to 7 gas lines
Power supplyUp to 4 generatorsUp to 8 generator
Carousel2-3-4 ou 6 axes2-3-4-6 or 8 axes
Carousel polarisationSolvix 15 kW 1000V low frequency 30 kHzSolvix 15 kW 1000V low frequency 30 kHz
Heating2 x 12 KW up to 500°C2 x 12 KW up to 500°C
Process rangeTiN, TiCN, AlTiN, AlTiSiN-TiSiN, AlCrN, AlCrSiN, AlTiCrN, TiAlN, Nitriding recipeTiAlCrNTiN, TiCN, AlTiN, AlTiSiN-TiSiN,AlCrN, AlCrSiN, AlTiCrN, TiAlCrNTiAlN, Nitriding recipe
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