Vacuum Magnetron Sputtering Machine
This range of vacuum magnetron sputtering machines is dedicated to both process developments and production. Based on a vertical axis cylindrical chamber, the versatility and variety of configurations perfectly meet the specific requests of customers. In this range of machines is the DP650 model, our best-seller having sold more than 50 equipment.
The AC450 frame is a PVD Thin Film Coating System by Magnetron Sputtering that presents a variety of configurations that will be able to design the most suitable system to match your specifications.
Versatile Magnetron Sputtering Equipment, the DP650 has a chamber diameter of 650 mm. This volume can accommodate for example either four 200 mm sources or six 100 mm sources.
The DP850 system is dedicated to production tasks. With a source configuration up to 6 x 200 mm magnetron cathodes, it enables the manufacturing of complex multilayers. The load lock optimizes time cycles and quality of deposited films.
Based on our DP range (vertical axis circular chamber) of PVD Thin Film Deposition System by Magnetron Sputtering for example, we have developed a version with a chamber diameter of 1100 mm.
Comparative features of the DP Range Magnetron Sputtering Machines
|Chamber Dimensions (mm)||Ø450 x 306||Ø650 x 320||Ø850 x 400||Ø1100 x 460|
|Usable Coating Surface (mm) *||Ø200||6 x Ø100||4 x Ø200||Ø300|
|Coating Surface Uniformity||± 2%||± 2%||± 3%||± 3%|