{"id":1521,"date":"2019-10-27T14:20:56","date_gmt":"2019-10-27T13:20:56","guid":{"rendered":"https:\/\/www.alliance-concept.com\/en\/?page_id=1521"},"modified":"2020-03-12T14:44:31","modified_gmt":"2020-03-12T13:44:31","slug":"cathode-sputtering","status":"publish","type":"page","link":"https:\/\/www.alliance-concept.com\/en\/cathode-sputtering.html","title":{"rendered":"Cathode Sputtering"},"content":{"rendered":"<p>[vc_row full_width=&#8221;stretch_row&#8221; css=&#8221;.vc_custom_1572780592503{background-position: center !important;background-repeat: no-repeat !important;background-size: cover !important;}&#8221;][vc_column][vc_row_inner][vc_column_inner][vc_column_text el_class=&#8221;titrepage&#8221;]<\/p>\n<h1 style=\"text-align: left\"><strong>Cathode Sputtering for PVD Equipment <\/strong><\/h1>\n<p>[\/vc_column_text][vc_column_text css=&#8221;.vc_custom_1584020033533{margin-top: 20px !important;border-left-width: 4px !important;padding-left: 10px !important;border-left-color: #414649 !important;border-left-style: solid !important;}&#8221;]The principle of <strong>cathode sputtering<\/strong> technology lies in the creation of a glow discharge between two electrodes. This discharge, realized within a rarefied atmosphere, <strong>under vacuum<\/strong>, allows the formation of a <strong class=\"d2b\">plasma<\/strong> composed of charged particles (electrons, ions, photons) and neutrals (atoms).[\/vc_column_text][vc_column_text css=&#8221;.vc_custom_1584020086063{margin-top: 20px !important;}&#8221;]The electric field generated by the difference in potential induces a movement of positively charged particles which are attracted by the <strong class=\"d2b\">cathode<\/strong> (target) and collide with it. This bombardment causes the <strong class=\"d2b\">sputtering of atoms<\/strong> or aggregates of atoms from the target which will condense on the substrate. On a macroscopic scale, this physical phenomenon could be compared to a \u201cbilliard breakage\u201d.<\/p>\n<p>In order to have an effective <strong class=\"d2b\">sputtering rate<\/strong>, the <strong class=\"d2b\">plasma gas<\/strong> used for this technology is the <strong class=\"d2b\">argon gas<\/strong>. Its atomic mass, its neutrality (complete valence shell), as well as its cost are ideal.[\/vc_column_text][\/vc_column_inner][\/vc_row_inner][\/vc_column][\/vc_row][vc_row full_width=&#8221;stretch_row&#8221; css=&#8221;.vc_custom_1572182508099{background-color: #ffffff !important;}&#8221;][vc_column width=&#8221;1\/2&#8243;][vc_column_text]The main steps are:<\/p>\n<ul>\n<li>Collision of incident ions on the target resulting in a transfer of kinetic energy and motion amount.<\/li>\n<li>Emission of atoms or aggregates with a given kinetic energy which settles down on the substrate and become a thin film of target material.<\/li>\n<\/ul>\n<p>This technology, commonly used in the industry of <strong>thin films<\/strong>, such as the <strong>semiconductor <\/strong>industry, sees its number of applications increase.\u00a0 Being a clean technology, it is a realistic and practical alternative to wet treatments.<\/p>\n<p><strong>The great majority of this type of PVD equipment uses magnetron cathode sputtering technology.<\/strong><\/p>\n<p>We also carry out <strong>PECVD<\/strong> (<strong>Plasma Enhanced Chemical Vapor Deposition<\/strong>) frames, being at the limit of CVD (Chemical Vapor Deposition) or <strong>chemical deposits,<\/strong> a complementary technology.[\/vc_column_text][\/vc_column][vc_column width=&#8221;1\/2&#8243;][vc_single_image image=&#8221;2745&#8243; add_caption=&#8221;yes&#8221; alignment=&#8221;center&#8221; css=&#8221;.vc_custom_1581496926143{margin-bottom: 0px !important;}&#8221;][vc_single_image image=&#8221;1522&#8243; add_caption=&#8221;yes&#8221; alignment=&#8221;center&#8221; css=&#8221;.vc_custom_1581456207426{margin-top: 0px !important;}&#8221;][\/vc_column][\/vc_row][vc_row][vc_column][vc_column_text]Discover the equipment that we manufacture using this <strong>cathodic sputtering technology<\/strong>.[\/vc_column_text][vc_row_inner][vc_column_inner width=&#8221;1\/4&#8243;][vc_btn title=&#8221; DP Equipment&#8221; style=&#8221;custom&#8221; custom_background=&#8221;#f23d37&#8243; custom_text=&#8221;#ffffff&#8221; align=&#8221;center&#8221; css_animation=&#8221;bounceInUp&#8221; link=&#8221;url:https%3A%2F%2Fwww.alliance-concept.com%2Fen%2Fdp-range-vacuum-magnetron-sputtering.html|title:Gamme%20DP||&#8221;][\/vc_column_inner][vc_column_inner width=&#8221;1\/4&#8243;][vc_btn title=&#8221;LINE Equipment&#8221; style=&#8221;custom&#8221; custom_background=&#8221;#f23d37&#8243; custom_text=&#8221;#ffffff&#8221; align=&#8221;center&#8221; css_animation=&#8221;bounceInUp&#8221; link=&#8221;url:https%3A%2F%2Fwww.alliance-concept.com%2Fen%2Fline-range-sputtering-machine.html|title:Gamme%20LINE||&#8221;][\/vc_column_inner][vc_column_inner width=&#8221;1\/4&#8243;][vc_btn title=&#8221;CT Equipment&#8221; style=&#8221;custom&#8221; custom_background=&#8221;#f23d37&#8243; custom_text=&#8221;#ffffff&#8221; align=&#8221;center&#8221; css_animation=&#8221;bounceInUp&#8221; link=&#8221;url:https%3A%2F%2Fwww.alliance-concept.com%2Fen%2Fcluster-range-pvd.html|title:Gamme%20CT||&#8221;][\/vc_column_inner][vc_column_inner width=&#8221;1\/4&#8243;][vc_btn title=&#8221;DECORA Equipment&#8221; style=&#8221;custom&#8221; custom_background=&#8221;#f23d37&#8243; custom_text=&#8221;#ffffff&#8221; align=&#8221;center&#8221; css_animation=&#8221;bounceInUp&#8221; link=&#8221;url:https%3A%2F%2Fwww.alliance-concept.com%2Fen%2Fdecora-range-thin-film-deposition.html|title:Gamme%20DP||&#8221;][\/vc_column_inner][\/vc_row_inner][\/vc_column][\/vc_row][vc_row][vc_column][vc_separator color=&#8221;black&#8221; el_width=&#8221;70&#8243;][\/vc_column][\/vc_row][vc_row][vc_column][vc_btn title=&#8221;CONTACT US&#8221; style=&#8221;custom&#8221; custom_background=&#8221;#e41a14&#8243; custom_text=&#8221;#ffffff&#8221; size=&#8221;lg&#8221; align=&#8221;right&#8221; css_animation=&#8221;bounceInRight&#8221; link=&#8221;url:https%3A%2F%2Fwww.alliance-concept.com\/en%2Fcontact.html|title:Contact||&#8221; css=&#8221;.vc_custom_1581456296297{margin-top: 30px !important;}&#8221;][\/vc_column][\/vc_row]<\/p>\n","protected":false},"excerpt":{"rendered":"<p>[vc_row full_width=&#8221;stretch_row&#8221; css=&#8221;.vc_custom_1572780592503{background-position: center !important;background-repeat: no-repeat !important;background-size: cover !important;}&#8221;][vc_column][vc_row_inner][vc_column_inner][vc_column_text el_class=&#8221;titrepage&#8221;] Cathode Sputtering for PVD Equipment [\/vc_column_text][vc_column_text css=&#8221;.vc_custom_1584020033533{margin-top: 20px !important;border-left-width: 4px !important;padding-left: 10px !important;border-left-color: #414649 !important;border-left-style: solid !important;}&#8221;]The principle of cathode sputtering technology lies in the creation of a glow discharge between two electrodes. This discharge, realized within a rarefied atmosphere, [&hellip;]<\/p>\n","protected":false},"author":1,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"footnotes":""},"class_list":["post-1521","page","type-page","status-publish","hentry"],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v27.6 - https:\/\/yoast.com\/product\/yoast-seo-wordpress\/ -->\n<title>Cathode sputtering, PVD, thin film deposition machine<\/title>\n<meta name=\"description\" content=\"Alliance Concept build PVD machines and cathode sputtering. 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