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Large size equipments

MIH 2800

Metal coater for large size plastic parts. Work chamber diameter 2,80 m for 4 m length.

MIH 2800
Metal coater MIH 2800
 



The process involve two steps :

  • The first step is a surface preparation by glow discharge to enhance the coating adherence
  • The second step is a metal deposition by thermal evaporation.

The evaporation process is realized with some tungsten filament. On this equipment two independent evaporation line are installed, to allow to work by co-evaporation or to deposit binary metal alloys.

 glow discharge step
Glow discharge step

FACET 1600

This equipment is developed to realize metal coatings by magnetron sputtering on bulk pieces. Work chamber diameter 2,00 m for 4,50 m length.

FACET 1600
Metal coater FACET 1600

The work chamber is divided in two parts by perforated wall.

The dimensions of the opening was calculated to limit the gases exchange between the two half-chambers.

This techniques allows to realize two processes (etching and sputtering) in only one phase.
FACET 1600
Intern tool and wagon		 FACET 1600
  Intern tool

Rectangular magnetron cathode
  Rectangular magnetron cathode

The pieces loading and unloading is made without breaking the vacuum.

The pieces advance in the chambers is realised by the rotation of the barrel which contains the cathodes.

Four magnetron cathodes allow metal alloys coatings by co-sputtering or multilayer metal coatings by successive sputtering.

 

Special equipments

DP 2000

DP2000
DP 2000

Coating equipments comprising six independent chambers with an insertion load lock. This machine is developed to the DVD-RW elaboration.
To realize this equipment and fulfil all the technical specifications of our customer, we developed a new high performance magnetron cathode generation (publication “Le Vide” n°302 (2001) pages 691-697). Cathode "2000"
Cathode "2000"
The water cooled arm substrates holder is animated of a rotation movement allowing the positioning front of one of the six cathodes. The closing of the chambers is realized by the horizontal translation of the substrate holder.

Chamber
Chamber

 Substrate holder arm
Substrate holder arm
 

Last modification : 27/05/05